Document Type

Article

Publication Date

1985

Publication Title

Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films

Abstract

Microstructural features of sputtered chromium and chromium‐50 wt.% platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf‐sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size of less than 100 Å after a 320 °C heat treatment for 1 h. The chromium‐50 wt. % platinum film remained amorphous after the same heat treatment. The as‐sputtered dc magnetron chromium film was crystalline.

Volume

3

Issue

6

First Page Number

2623

Last Page Number

2626

DOI

10.1116/1.572800

Publisher Statement

Copyright 1985 American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Vacuum Society. The following article appeared in Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films 3:6 and may be found at http://dx.doi.org/10.1116/1.572800.

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