Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films
Microstructural features of sputtered chromium and chromium‐50 wt.% platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf‐sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size of less than 100 Å after a 320 °C heat treatment for 1 h. The chromium‐50 wt. % platinum film remained amorphous after the same heat treatment. The as‐sputtered dc magnetron chromium film was crystalline.
Fishkis, M. R.
, Sisson, Richard D.
, Biederman, Ronald R.
(1985). A Transmission Electron-Microscopy Study of RF-Magnetron-Sputtered and DC-Magnetron-Sputtered Thin-Film Chromium and Chromium Platinum Coatings. Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 3(6), 2623-2626.
Retrieved from: https://digitalcommons.wpi.edu/mechanicalengineering-pubs/65
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Copyright 1985 American Vacuum Society. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Vacuum Society. The following article appeared in Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films 3:6 and may be found at http://dx.doi.org/10.1116/1.572800.