Faculty Advisor

Cuneo, Joshua M

Faculty Advisor

Currier, Blake Hoag

Project Center

Zurich, Switzerland

Abstract

Magnetron sputter deposition is integral in the creation of semiconductor devices like integrated computing chips and electron microscope slides. The goal of this project was to characterize target erosion during the magnetron sputtering process using both GEANT4 Monte Carlo simulations and experimental methods. This was completed using an electron motion simulation and sputtering experiments with copper and aluminum targets. These results showcased that target erosion is based on target material and magnet placement, not particle energy.

Publisher

Worcester Polytechnic Institute

Date Accepted

2019-10-07

Major

Computer Science

Major

Physics

Project Type

Major Qualifying Project

Accessibility

Unrestricted

Advisor Department

Computer Science

Advisor Department

Physics

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